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Profile:Manufacturer - Producer|Ref:PSL183287YH | Country: China | Currency: | Export: No
FD12-158J Metallurgical Microscope is developed by the need of Semiconductor industry, Wafer manufacturing, Electronic information industry and Metallurgical industry. As an advanced user of Metallurgical microscope, the user can experience it’s super performance when using it. It can be extensively used in detection of Semiconductor, FPD, Circuit encapsulation, Circuit substrate, Material, Casting /Meta l/ Ceramic parts, Precision moulds.
◆It is adopted with reflecting and transmitted illumination, You can do Bright and Dark field, DIC and Polarizing Observation under reflecting illumination, also can do Bright field observation under transmitted illumination.
◆Reliable optical system and high quality makes clearer and shaper image, much better the contrast grade.
◆The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
◆Adopted with UIS high resolution, long working distance and infinity light path correcting system objective imaging technology.
◆Extending the multiplexing technology of objective, compatible infinity objective with all observation methods, including Bright & Dark field, polarization and DIC observation, also provide with high clear and sharp image in each observation method.
◆Aspherical surface Kohler illumination, increasing the viewing brightness.
◆The Nosepiece can be equipped with detachable DIC differential interference device.
◆Standard total magnification: 50X,100X,200X,400X
◆Eyepiece: Wide field WF10X（Φ25mm）,Wide field WF10X（Φ20mm）,with 0.1mm crosshair reticle
◆Viewing head: Compensation Free Trinocular head, inclined 30°,Interpupillary adjusting distance:50mm-75mm
◆Objective: Long working distance bright & dark field Infinity plan Objectives:5X,10X,20X,40X
◆Focusing: Coaxial coarse and fine focusing adjustment with rack and pinion mechanism. Fine Focusing Scale Value:0.002mm
◆Nosepiece: Quadruple Nosepiece with DIC Jack
◆Condenser:N.A.1.25 Abbe Condenser with iris diaphragm and filter
◆Mechanical stage: Double layer mechanical Moving stage, Size: 189mmX160mm,Moving range:80mmX50mm
◆Light source: Halogen Bulb12V/50W,AC85V-230V ; With aperture iris diaphragm and field iris diaphragm, Halogen Bulb12V/50W,AC85V-230V；Adjustable Brightness
Eyepiece Wide field WF10X（Φ25mm）,Wide field WF10X（Φ20mm）,with 0.1mm crosshair reticle
Objective Long working distance bright & dark field Infinity plan Objective: 5X/0.1 WD=29.4mm
Long working distance bright & dark field Infinity plan Objective: 10X/0.25 WD=16mm
Long working distance bright & dark field Infinity plan Objective: 20X/0.40 WD=10.6mm
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