AZO Transparent Conductive Coating Line
Brief introduction:
The horizontal/vertical continuous magnetron sputtering AZO film coating line designed to be composed of 7 chambers, i.e. input chamber, fore-buffering transition chamber, fore-transmission chamber, Sputtering deposition chamber, post-transmission chamber, post buffering transition chamber, output chamber respectively. Two pairs of MF Si twin targets under PUC04 closed loop control to produce high-quality SiO2 isolated layer. Equipped with 10 pairs of AZO rotary target to realize high-quality AZO transparent conductive film, the machine line designed for substrate glass dimension 1100mm in width, 1400mm in length with production cycle optimized to 100-180 seconds. Furthermore, with turbo-pump group equipped for effective gas isolation in design, it obtains highly efficient isolation from contamination, stable pumping velocity and uniform distribution of operation gas.
