Description
Horizontal CVD tube furnace (Silicon Carbide) uses methyltrichlorosilane (MTS) as air source to make material surface oxidation resistant coating and change characters of matrix material.
Technical Features
- High corrosive tail gas, combustible and explosion gas, solid dust and low melting point product can be treated effectively during deposition process.
- Horizontal chemical vapor deposition furnace uses special designed deposition chamber, which assures good sealing effect and strong antipollution ability.
- The most advance control technology is adopted to precise control the MTS flow and pressure , realizing stable deposition airflow and narrow pressure fluctuation range.
- The new design anti corrosion vacuum unit ensures long continuous working period and low maintainence rate.
- Multiple deposition channels achieve flow field uniformity, non-deposition dead corner and better deposition effect.
6.The furnace working zone size can reach 2.5m × 2.5m × 5m,it can satisfy supersize part CVD treatment.
