Pulvérisation en céramique vise les cibles de pulvérisation en céramique
1?Boride : Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, BNB, NbB2, onglet, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2
2?Carbide céramique Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC
3?Fluoride céramique Sputtering Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ERF-3, HfF4, KFLaF3, PbF2, FRV, PRF-3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolithe, Na3AlF6, SrF2, ThF4, YF3, YbF3
4?Nitrides des cibles de pulvérisation en céramique : AlN, BN, GaN, PNH, NbN, Si3N4, TaN, TiN, VN, ZrN
5?Oxide céramique Sputtering targets : Al2O3, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr (TiO2) 2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2(unstabilized), ZrO2-5-15wt % CaO)
6?Selenides céramique cibles de pulvérisation cathodique : Bi2Se3, CdSe, In2Se3, au PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe
7?Silicides céramique cibles de pulvérisation cathodique: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2
8?Sulfides céramique Sputtering Targets : CuS, Sb2S3, As2S3, CdS, FeS, PbS, MoS2, NbS1.75, TaS2, WS2, ZnS
D?Other : AZO, Cr-SiO, CIGS, ITO, IGZO, GaAs, Ga-P, en-Sb, InAs, InP, InSn, LSMO, Na3AlF6, YBCO, LCMO, YSZ
