Description
Vertical CVD tube furnace (Silicon Carbide) adopts methyltrichlorosilane (MTS) as air source to make material surface oxidation resistant coating and change characters of matrix material.
Technical Features
- The most advance control technology is adopted to control flow and pressure of MTS, realizing stable deposition airflow and small pressure fluctuation range.
- Vacuum chemical vapor deposition furnace uses special designed deposition chamber, which assures good sealing effect and great contamination protection performance.
- Multiple deposition channels assure flow field uniformity, non-deposition dead corner and great deposition surface.
- It has treatment for the high corrosive tail gas, flammable and explosive gas, solid dust and low melting point sticky materials during the deposition process.
- The new design anti corrosion vacuum unit ensures long continuous working hours and short maintainence time.
